Correction to: Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching (vol 43, 023007, 2025)

Arvind, ShikharShikharArvindFallica, RobertoRobertoFallicaBezard, PhilippePhilippeBezardPetersen, JohnJohnPetersenDe Gendt, StefanStefanDe GendtLarsen, Esben W.Esben W.Larsen2025-04-012025-04-0120250734-2101https://imec-publications.be/handle/20.500.12860/45475Correction to: Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching (vol 43, 023007, 2025)Journal article correction10.1116/6.0004555WOS:001451261400001