High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print

Bekaert, JoostJoostBekaertSchatz, JirkaJirkaSchatzHosoya, SotaroSotaroHosoyaKomami, HideakiHideakiKomamiRoy, SyamashreeSyamashreeRoyLibeert, GuillaumeGuillaumeLibeertBaskaran, BalakumarBalakumarBaskaranPhilipsen, VickyVickyPhilipsenHendrickx, EricEricHendrickxTrivkovic, DarkoDarkoTrivkovicWelling, UlrichUlrichWellingTomizuka, ShosukeShosukeTomizukaYamaji, MasatakaMasatakaYamajiTomita, TatsuyaTatsuyaTomitaFujii, NobuakiNobuakiFujiiYoshikawa, ShingoShingoYoshikawaNakaya, HidekiHidekiNakayaIwai, ToshimichiToshimichiIwaiOkawa, TatsuroTatsuroOkawaIto, WataruWataruItoKojima, ShinichiShinichiKojima2026-03-312026-03-312025978-1-5106-9320-30277-786Xhttps://imec-publications.be/handle/20.500.12860/58979engHigh-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer PrintProceedings paper10.1117/12.3078279WOS:001674167600038