Plasma etch challenges of Directed Self-Assembly (DSA) for fin and contact holes patterning in 7nm (N7) technology node

Chan, BTBTChanSayan, SafakSafakSayanBekaert, JoostJoostBekaertDoise, JanJanDoiseGronheid, RoelRoelGronheidde Marneffe, Jean-FrancoisJean-Francoisde MarneffeXu, KaidongKaidongXu2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23623Plasma etch challenges of Directed Self-Assembly (DSA) for fin and contact holes patterning in 7nm (N7) technology nodeMeeting abstract