Schaekers, MarcMarcSchaekersCapon, B.B.CaponDetavernier, C.C.DetavernierBlasco, N.N.Blasco2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17953Deposition Of Ru and RuO2 flms for DRAM electrodeMeeting abstract