Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbon

Stevens, EricEricStevensTomczak, YoannYoannTomczakChan, BTBTChanAltamirano Sanchez, EfrainEfrainAltamirano SanchezParsons, GregoryGregoryParsonsDelabie, AnneliesAnneliesDelabie2021-10-262021-10-2620180897-4756https://imec-publications.be/handle/20.500.12860/31856Area-selective atomic layer deposition of TiN, TiO2, and HfO2 on silicon ntride with inhibition on amorphous carbonJournal articlehttps://pubs.acs.org/doi/10.1021/acs.chemmater.8b00017