Elimination of HF-last cleaning related CoSi2 defects formation

Zou, GangGangZouJonckx, FrankyFrankyJonckxAlves Donaton, RicardoRicardoAlves DonatonKuper, WernerWernerKuperMaex, KarenKarenMaexMertens, PaulPaulMertensMeuris, MarcMarcMeurisHeyns, MarcMarcHeynsLocke, KlausKlausLockeKorac, M.M.KoracSchild, R.R.Schild2021-09-292021-09-291994https://imec-publications.be/handle/20.500.12860/478Elimination of HF-last cleaning related CoSi2 defects formationProceedings paper