A novel resist and post-etch residue removal process using ozonated chemistry

De Gendt, StefanStefanDe GendtSnee, PeterPeterSneeCornelissen, IngridIngridCornelissenLux, MarcelMarcelLuxVos, RitaRitaVosMertens, PaulPaulMertensKnotter, D. M.D. M.KnotterMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3354A novel resist and post-etch residue removal process using ozonated chemistryProceedings paper