Barrier reliability on sub-100nm copper low-k interconnects

Tokei, ZsoltZsoltTokeiGailledrat, T.T.GailledratLi, YunlongYunlongLiSchuhmacher, JorgJorgSchuhmacherMandrekar, T.T.MandrekarGuggilla, S.S.GuggillaMebarki, BencherkiBencherkiMebarkiMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9684Barrier reliability on sub-100nm copper low-k interconnectsOral presentation