Sub-1nm EOT scaling for high-k metal-gate stacks

Heyns, MarcMarcHeynsSchram, TomTomSchramRagnarsson, Lars-AkeLars-AkeRagnarssonDe Gendt, StefanStefanDe GendtKerber, AndreasAndreasKerber2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9030Sub-1nm EOT scaling for high-k metal-gate stacksJournal article