Post-CMP cleaners for tungsten at advanced nodes

Lieten, RubenRubenLietenWhite, DanielaDanielaWhiteParson, ThomasThomasParsonJenq, ShiningShiningJenqFrye, DonDonFryeWhite, MichaelMichaelWhiteTeugels, LieveLieveTeugelsStruyf, HerbertHerbertStruyf2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26912Post-CMP cleaners for tungsten at advanced nodesProceedings paper