Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies

Davydova, NataliaNataliaDavydovaKottumakulal, RamRamKottumakulalHageman, J.J.HagemanMcNamara, J.J.McNamaraHoefnagels, RikRikHoefnagelsVaenkatesan, V.V.Vaenkatesanvan Dijk, AndreAndrevan DijkRicken, K.K.Rickende Winter, L.L.de WinterDe Kruif, RobertRobertDe KruifJonckheere, RikRikJonckheereHollink, T.T.HollinkSchiffelers, GuidoGuidoSchiffelersvan Setten, EelcoEelcovan SettenColsters, P.P.ColstersLiebregts, W.W.LiebregtsPellens1, RudyRudyPellens1van Dijk, JoepJoepvan Dijk2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25124Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategiesProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2436941&resultClick=1