Zhang, FenghongFenghongZhangOp de Beeck, MaaikeMaaikeOp de BeeckRonse, KurtKurtRonseGangala, Hareen KHareen KGangalaGopalan, P.P.GopalanConley, P.P.ConleyDusa, M.M.DusaBendik, JoeJoeBendik2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3168CD control using SiON BARL processing for sub 0.25µm lithographyOral presentation