Direct imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted silicon

Koelling, SebastianSebastianKoellingRichard, OlivierOlivierRichardBender, HugoHugoBenderUematsu, M.M.UematsuSchulze, AndreasAndreasSchulzeZschaetzsch, GerdGerdZschaetzschGilbert, MatthieuMatthieuGilbertVandervorst, WilfriedWilfriedVandervorst2021-10-212021-10-2120131530-6984https://imec-publications.be/handle/20.500.12860/22610Direct imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted siliconJournal article