Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks

Xu, ZhenZhenXuHoussa, MichelMichelHoussaCarter, RichardRichardCarterNaili, MohamedMohamedNailiDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152002https://imec-publications.be/handle/20.500.12860/7071Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacksJournal article