Baklanov, MikhaïlMikhaïlBaklanovConard, ThierryThierryConardLanckmans, FilipFilipLanckmansVanhaelemeersch, SergeSergeVanhaelemeerschHolmes, D.D.HolmesMaex, KarenKarenMaex2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4087Characterisation of plasma etch releted residues formed on top of ECD Cu filmsProceedings paper