Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists

Winroth, GustafGustafWinrothYounkin, ToddToddYounkinBlackwell, James M.James M.BlackwellGronheid, RoelRoelGronheid2021-10-202021-10-2020121071-1023https://imec-publications.be/handle/20.500.12860/21856Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresistsJournal article