Roughness evolution during the atomic layer deposition of metal oxides

Peter, AntonyAntonyPeterDelabie, AnneliesAnneliesDelabieRodriguez, LeonardLeonardRodriguezMoussa, AlainAlainMoussaAdelmann, ChristophChristophAdelmann2021-10-212021-10-2120130734-2101https://imec-publications.be/handle/20.500.12860/22923Roughness evolution during the atomic layer deposition of metal oxidesJournal articlehttp://dx.doi.org/10.1116/1.4812707