Defect avoidance for extreme-ultraviolet mask defects using intentional pattern deformation

Chae, Yoo-jinYoo-jinChaeJonckheere, RikRikJonckheereGupta, PuneetPuneetGupta2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30378Defect avoidance for extreme-ultraviolet mask defects using intentional pattern deformationProceedings paperhttps://doi.org/10.1117/12.2501525