Mechanisms of arsenic segregation to the Ni2Si/SiO2 interface during Ni2Si formation

Kmieciak, MalgorzataMalgorzataKmieciakJanssens, TomTomJanssensLauwers, AnneAnneLauwersVantomme, AndreAndreVantommeVandervorst, WilfriedWilfriedVandervorstMaex, KarenKarenMaexKittl, JorgeJorgeKittl2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10706Mechanisms of arsenic segregation to the Ni2Si/SiO2 interface during Ni2Si formationJournal article