Jonckheere, RikRikJonckheereVandenberghe, GeertGeertVandenbergheWiaux, VincentVincentWiauxVerhaegen, StafStafVerhaegenRonse, KurtKurtRonse2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5380Reticle quality needs for advanced 193 nm lithographyProceedings paper