Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integration

Kesters, ElsElsKestersClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeBarthomeuf, KevinKevinBarthomeufLux, MarcelMarcelLuxVereecke, GuyGuyVereeckeDurkee, JohnJohnDurkee2021-10-172021-10-1720090167-9317https://imec-publications.be/handle/20.500.12860/15587Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integrationJournal article