Paramagnetic point defects at interfacial layer in biaxial tensile strained (100)Si/SiO2

Somers, P.P.SomersStesmans, AndreAndreStesmansAfanas'ev, V.V.V.V.Afanas'evClaeys, CorCorClaeysSimoen, EddyEddySimoen2021-10-172021-10-1720080021-8979https://imec-publications.be/handle/20.500.12860/14497Paramagnetic point defects at interfacial layer in biaxial tensile strained (100)Si/SiO2Journal article