Determination of photoresist degradation products in O-3/DI processing

Vankerckhoven, H.H.VankerckhovenDe Smedt, F.F.De SmedtVan Herp, B.B.Van HerpClaes, MartineMartineClaesDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsVinckier, ChrisChrisVinckier2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/7001Determination of photoresist degradation products in O-3/DI processingJournal article