Hendrickx, EricEricHendrickxLorusso, GianGianLorussoVan Setten, EelcoEelcoVan SettenHansen, SteveSteveHansenJiang, JiongJiongJiangLiu, WeiWeiLiuChen, LuogiLuogiChen2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15458Accurate models for EUV LithographyProceedings paper