Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography

Van Look, LieveLieveVan LookBekaert, JoostJoostBekaertLaenens, BartBartLaenensVandenberghe, GeertGeertVandenbergheRichter, JanJanRichterBubke, KarstenKarstenBubkePeters, Jan HendrikJan HendrikPetersSchreel, KoenKoenSchreelDusa, MirceaMirceaDusa2021-10-192021-10-192011-031537-1646https://imec-publications.be/handle/20.500.12860/19986Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithographyJournal article