High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers

Armeanu, Ana-MariaAna-MariaArmeanuPellens, NickNickPellensPhilipsen, VickyVickyPhilipsenMalankin, EvgenyEvgenyMalankinXu, DongboDongboXuMizuuchi, KeisukeKeisukeMizuuchiCurvacho, GabrielGabrielCurvachoWei, Chih-, IChih-, IWeiLafferty, NealNealLaffertyFenger, GermainGermainFenger2025-06-202024-11-162025-06-202024978-1-5106-8288-70277-786XWOS:001327624200026https://imec-publications.be/handle/20.500.12860/44792High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbersProceedings paper10.1117/12.3031718978-1-5106-8289-4WOS:001327624200026