New slurry formulation for copper-CMP process in a damascene integration scheme

Terzieva, ValentinaValentinaTerzievaSijmus, BramBramSijmusMeuris, MarcMarcMeurisPuppe, LotharLotharPuppePassing, GerdGerdPassing2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6876New slurry formulation for copper-CMP process in a damascene integration schemeProceedings paper