Lucas, KevinKevinLucasCork, ChrisChrisCorkMiloslavsky, AlexAlexMiloslavskyLuk-Pat, GerryGerryLuk-PatLi, XiaohaiXiaohaiLiBarnes, LeviLeviBarnesGao, WeiminWeiminGaoWiaux, VincentVincentWiaux2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/15762Double patterning OPC and design for 22nm to 16nm device nodesProceedings paper