Franquet, AlexisAlexisFranquetConard, ThierryThierryConardVandervorst, WilfriedWilfriedVandervorstSioncke, SonjaSonjaSionckeCaymax, MattyMattyCaymaxDelabie, AnneliesAnneliesDelabieHeyns, MarcMarcHeynsMeuris, MarcMarcMeurisBrammertz, GuyGuyBrammertzVan Hemmen, J.L.J.L.Van HemmenKeuning, WWKeuningKessels, W.M.M.W.M.M.Kessels2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13737Physical characterization of ALD Al2O3 films deposited on GaAs substratesMeeting abstract