Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV

Das, SayantanSayantanDasSah, KaushikKaushikSahLiang, ArdisArdisLiangRoy, HemantaHemantaRoyTran, KhaKhaTranBabu, BineshBineshBabuHegde, ArjunArjunHegdeCross, AndrewAndrewCrossLeray, PhilippePhilippeLerayHalder, SandipSandipHalder2022-08-312022-05-222022-06-162022-07-082022-08-052022-08-312021978-1-5106-4552-30277-786XWOS:000792657300014https://imec-publications.be/handle/20.500.12860/39870Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUVProceedings paper10.1117/12.2600954978-1-5106-4553-0WOS:000792657300014