Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques

Redolfi, AugustoAugustoRedolfiSleeckx, ErikErikSleeckxDevriendt, KatiaKatiaDevriendtShamiryan, DenisDenisShamiryanVandeweyer, TomTomVandeweyerHoriguchi, NaotoNaotoHoriguchiTogo, MitsuhiroMitsuhiroTogoWouters, Johan M. D.Johan M. D.WoutersJurczak, GosiaGosiaJurczakHoffmann, Thomas Y.Thomas Y.HoffmannCockburn, AndrewAndrewCockburnGravey, VirginieVirginieGraveyDiehl, D.L.D.L.Diehl2021-10-192021-10-192011-03https://imec-publications.be/handle/20.500.12860/19676Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniquesProceedings paperhttp://tyndall.emakina-eu.net/projects/home/1120