A novel low temperature etch approach to reduce ULK plasma damage

Zhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeLeroy, F.F.LeroyLjazouli, R.R.LjazouliLefaucheux, P.P.LefaucheuxTillocher, TTTillocherDussart, R.R.DussartMaekawa, K.K.MaekawaYatsuda, K.K.YatsudaDussarrat, C.C.DussarratDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26241A novel low temperature etch approach to reduce ULK plasma damageMeeting abstracthttp://pesm-conference.org/files/2015_abstractbook.pdf