Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography

Lorusso, GianGianLorussoMao, MingMingMaoReijnen, LiesbethLiesbethReijnenViatkina, KatjaKatjaViatkinaKnops, RoelRoelKnopsFliervoet, TimonTimonFliervoet2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25577Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithographyProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211092