Lithography as a critical step for low-k dual damascene: from 248nm to 193nm

Ronse, KurtKurtRonseMaenhoudt, MireilleMireilleMaenhoudtPollentier, IvanIvanPollentierWiaux, VincentVincentWiauxStruyf, HerbertHerbertStruyfLepage, MurielMurielLepageVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4708Lithography as a critical step for low-k dual damascene: from 248nm to 193nmProceedings paper