TXRF layer analysis for advanced micro-electronic applications: a two case study, HfO2/Si and Si/Ge

Hellin, DavidDavidHellinRip, JensJensRipDelabie, AnneliesAnneliesDelabieBonzom, RenaudRenaudBonzomDe Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckier2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10566TXRF layer analysis for advanced micro-electronic applications: a two case study, HfO2/Si and Si/GeMeeting abstract