Ultra-low k dielectric and plasma damage control for advanced technology nodes (10-nm and below)

Lazzarino, FredericFredericLazzarinoKrishtab, MikhailMikhailKrishtabTahara, ShigeruShigeruTaharaBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22652Ultra-low k dielectric and plasma damage control for advanced technology nodes (10-nm and below)Meeting abstracthttp://www2.avs.org/symposium/avs60/pdfs/abstractbook.pdf