Implementation of ArF resist processes for 130nm and below

Goethals, MiekeMiekeGoethalsVan Roey, FriedaFriedaVan RoeyVandenberghe, GeertGeertVandenbergheJaenen, PatrickPatrickJaenenPollers, IngridIngridPollersPollentier, IvanIvanPollentierRonse, KurtKurtRonse2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4398Implementation of ArF resist processes for 130nm and belowJournal article