Double patterning induced process bias induced for various LPL alternatives

Wong, PatrickPatrickWongVandenbroeck, NadiaNadiaVandenbroeckWiaux, VincentVincentWiauxGronheid, RoelRoelGronheid2021-10-192021-10-192010https://imec-publications.be/handle/20.500.12860/18369Double patterning induced process bias induced for various LPL alternativesProceedings paper