Improvement of high temperature water rinsing and drying for HF-last wafer cleaning

Li, LiLiLiBender, HugoHugoBenderZou, GangGangZouMertens, PaulPaulMertensMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1322Improvement of high temperature water rinsing and drying for HF-last wafer cleaningJournal article