Philipsen, VickyVickyPhilipsenDe Bisschop, PeterPeterDe BisschopHendrickx, EricEricHendrickxWiaux, VincentVincentWiauxVandenberghe, GeertGeertVandenbergheJonckheere, RikRikJonckheere2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12702IMEC lithography activities for 45nm node and beyond: mask impactOral presentation