Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns

Foubert, PhilippePhilippeFoubertDe Bisschop, PeterPeterDe BisschopBekaert, JoostJoostBekaertBeral, ChristopheChristopheBeralRincon Delgadillo, PaulinaPaulinaRincon Delgadillo2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32973Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patternsProceedings paper10.1117/12.2539592