Tang, FuFuTangJiang, XiaoqiangXiaoqiangJiangXie, QiQiXieGivens, MichaelMichaelGivensMaes, JanJanMaesSioncke, SonjaSonjaSionckeIvanov, TsvetanTsvetanIvanovNyns, LauraLauraNynsLin, DennisDennisLinCollaert, NadineNadineCollaert2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29551Atomic layer deposition of novel interface layers on III-V channel devicesProceedings paper