Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment

Urbanowicz, AdamAdamUrbanowiczBaklanov, MikhaïlMikhaïlBaklanovHeijlen, JeroenJeroenHeijlenTravaly, YoussefYoussefTravalyCockburn, AndrewAndrewCockburn2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13005Damage reduction and sealing of low-k films by combined He and NH3 plasma treatmentJournal article