Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma

Shamiryan, DenisDenisShamiryanBaklanov, MikhaïlMikhaïlBaklanovVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6820Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasmaJournal article