Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching

Arvind, ShikharShikharArvindFallica, RobertoRobertoFallicaBezard, PhilippePhilippeBezardPetersen, JohnJohnPetersenDe Gendt, StefanStefanDe GendtWitting Larsen, EsbenEsbenWitting Larsen2025-03-142025-03-092025-03-142025-02-260734-2101WOS:001434101500002https://imec-publications.be/handle/20.500.12860/45362Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etchingJournal article10.1116/6.0004265WOS:001434101500002Materials scienceREFRACTIVE-INDEX INCREASERELAXATIONSURFACEARGONFILMS