Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study

Sarkar, Sujan KumarSujan KumarSarkarDas, SayantanSayantanDasBlanco, VictorVictorBlancoLeray, PhilippePhilippeLerayHalder, SandipSandipHalder2023-04-062023-03-012023-04-0620221932-5150WOS:000924949300030https://imec-publications.be/handle/20.500.12860/41203Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast studyJournal article10.1117/1.JMM.21.4.044901WOS:000924949300030