Kamei, YuyaYuyaKameiShiozawa, TakahiroTakahiroShiozawaKawakami, ShinichiroShinichiroKawakamiShite, HideoHideoShiteIchinomiya, HiroshiHiroshiIchinomiyaEnomoto, MasashiMasashiEnomotoNafus, KathleenKathleenNafusDemand, MarcMarcDemandFoubert, PhilippePhilippeFoubert2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28635Technology for defectivity improvement in resist coating and developing process in EUV lithography processProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2615277