P implantation on doping of Ge: diffusion, activation, re-crystallization

Satta, AlessandraAlessandraSattaJanssens, TomTomJanssensClarysse, TrudoTrudoClarysseSimoen, EddyEddySimoenMeuris, MarcMarcMeurisBenedetti, AlessandroAlessandroBenedettiHoflijk, IlseIlseHoflijkDe Jaeger, BriceBriceDe JaegerDemeurisse, CarolineCarolineDemeurisseVandervorst, WilfriedWilfriedVandervorst2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11165P implantation on doping of Ge: diffusion, activation, re-crystallizationProceedings paper