Comparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin films

Bourdais, S.S.BourdaisBeaucarne, GuyGuyBeaucarneSlaoui, A.A.SlaouiPoortmans, JefJefPoortmansSemmache, B.B.SemmacheDubois, C.C.Dubois2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3266Comparative study of rapid and classical thermal phosphorus diffusion in polycrystalline silicon thin filmsOral presentation