Braun, S.S.BraunVos, RitaRitaVosKlipp, AndreasAndreasKlippClaes, MartineMartineClaesBittner, ChristianChristianBittnerAlbert, JohanJohanAlbertHoriguchi, NaotoNaotoHoriguchiStruyf, HerbertHerbertStruyf2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22077Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metalsProceedings paper